Bias power supply for RF plasma reactors
Development of a plasma driver for the more accurate production of ICs
What is it?
RF plasma reactors are used in the production of semiconductors for various purposes. Such as etching and deposition of layers on ICs. The better the control over the plasma, the more accurate and smaller the ICs can be produced.
Together with researchers in the field of plasma physics, I performed measurements on plasma reactor processes and on that basis devised and developed an electronics topology that provides more control over the plasma. This results in a more accurate production process.
The power electronics topology is patented.