Bias power supply for RF plasma reactors
Development of a plasma driver for the more accurate production of ICs
What is it?
RF plasma reactors are used in the production of semiconductors for various purposes. Such as etching and deposition of layers on ICs. The better the control over the plasma, the more accurate and smaller the ICs can be produced.
The process
Together with researchers in the field of plasma physics, I performed measurements on plasma reactor processes and on that basis devised and developed an electronics topology that provides more control over the plasma. This results in a more accurate production process.
The power electronics topology is patented.
Getting started with electronic development?
Would you like to find out how I can help you?
Get in touch so that we can get to grips with your questions.
E-mail me at: anton@adevelops.nl.
Call me at +316-17262694
Or use the contact form —I will get back to you to schedule an appointment.
